Dynamic scanning optical system optics: 1pc diki yekutarisisa lens, 1-2pcs inotarisisa lens, Galvo mirror. Iyo yose yemaziso lens inoumba basa rekuwedzera kwedanda, kutarisa uye kutsauswa kwedanda uye kuongorora.
Chikamu chirikurisa irenzi isina kunaka, kureva diki yekutarisa lens, iyo inoziva kuwedzera kwedanda uye kufamba kwe zoom, iyo inotarisisa lenzi inoumbwa neboka rema lenzi akanaka. Iyo galvo girazi igirazi mune galvanometer system.
(1) Optimization yekugadzira lens: Optimum ratio yedhayamita kune ukobvu reshiyo
(2) Lens yakakwira kukuvara chikumbaridzo:> 30J/cm2 10ns
(3) Ultra-low absorption coating, absorption rate: <20ppm
(4) Galvanometer ukobvu kusvika dhayamita reshiyo: 1:35
(5) Kurongeka kwelenzi:<= λ/5
Post-Objective Lens
Mudzidzi Mukuru Wekupinda (mm) | Optics 1 Diameter(mm) | Optics 2 Diameter(mm) | Optics 3 Diameter(mm) | Scan Field (mm) | Clear Aperture ye Scanner (mm) | Wavelength |
8 | 15 | 55 | 55 | 600x600 800x800 | 30 | 10.6um |
12 | 22 | 55 | 55 | 1600x1600 | 30 | |
8 | 16 | 55 | 55 | 600x600 800x800 | 30 | 1030-1090nm |
8 | 15 | 35 | 35 | 300x300 | 10 | 532nm |
8 | 15 | 35 | 35 | 300x300 | 10 | 355nm |
Reflector Mirror
Chikamu Tsanangudzo | Dhayamita(mm) | Hukobvu(mm) | Material | Coating |
Silicon Reflector | 25.4 | 3 | Silicon | HR@10.6um,AOI: 45° |
Silicon Reflector | 30 | 4 | Silicon | HR@10.6um,AOI: 45° |
Fiber Reflector | 25.4 | 6.35 | Fused Silica | HR@1030-1090nm, AOI: 45° |
Fiber Reflector | 30 | 5 | Fused Silica | HR@1030-1090nm, AOI: 45° |
Fiber Reflector | 50 | 10 | Fused Silica | HR@1030-1090nm, AOI: 45° |
532 Reflector | 25.4 | 6 | Fused Silica | HR@515-540nm/532nm, AOI: 45° |
532 Reflector | 25.4 | 6.35 | Fused Silica | HR@515-540nm/532nm, AOI: 45° |
532 Reflector | 30 | 5 | Fused Silica | HR@515-540nm/532nm, AOI: 45° |
532 Reflector | 50 | 10 | Fused Silica | HR@515-540nm/532nm, AOI: 45° |
355 Reflector | 25.4 | 6 | Fused Silica | HR@355nm&433nm, AOI: 45° |
355 Reflector | 25.4 | 6.35 | Fused Silica | HR@355nm&433nm, AOI: 45° |
355 Reflector | 25.4 | 10 | Fused Silica | HR@355nm&433nm, AOI: 45° |
355 Reflector | 30 | 5 | Fused Silica | HR@355nm&433nm, AOI: 45° |
Galvo Mirror
Chikamu Tsanangudzo | Mudzidzi Mukuru Wekupinda (mm) | Material | Coating | Wavelength |
55mmL*35mmW*3.5mmT-X 62mmL*43mmW*3.5mmT-Y | 30 | Silicon | MMR@10.6um | 10.6um |
55mmL*35mmW*3.5mmT-X 62mmL*43mmW*3.5mmT-Y | 30 | Fused Silica | HR@1030-1090nm | 1030-1090nm |
55mmL*35mmW*3.5mmT-X 62mmL*43mmW*3.5mmT-Y | 30 | Fused Silica | HR@532nm | 532nm |
55mmL*35mmW*3.5mmT-X 62mmL*43mmW*3.5mmT-Y | 30 | Fused Silica | HR@355nm | 355nm |
Dziviriro Lenzi
Dhayamita(mm) | Ukobvu (mm) | Material | Coating |
75 | 3 | ZnSe | AR/AR@10.6um |
80 | 3 | ZnSe | AR/AR@10.6um |
90 | 3 | ZnSe | AR/AR@10.6um |
90x60 | 5 | ZnSe | AR/AR@10.6um |
90x64 | 2.5 | ZnSe | AR/AR@10.6um |
90x70 | 3 | ZnSe | AR/AR@10.6um |